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Glossary Term: CMOS

Definition(s) for CMOS:


1. ) Complementary Metal Oxide Silicon. A Fabrication Process That Incorporates N-Channel And P-Channel Cmos Transistors Within The Same Silicon Substrate. Currently, Cmos Is The Most Commonly Used Ic Fabrication Process Technology And Is One Of The Latest Fabrication Techniques To Use Metal Oxide Semiconductor Transistors.

2. ) Complementary Metal Oxide Silicon. A Fabrication Process That Incorporates N-Channel And P-Channel Complementary Metal Oxide Semiconductor Transistors Within The Same Silicon Substrate. This Is The Most Commonly Used Integrated Circuit Fabrication Process Technology.

3. ) Complementary Metal Oxide Silicon. Currently The Most Common Integrated Circuit Fabrication Process Technology. Cmos Is One Of The Latest Fabrication Techniques To Use Metal Oxide Semiconductor

4. ) Complementary Metal Oxide Silicon. A Fabrication Process That Incorporates N-Channel And P-Channel Cmos Transistors Within The Same Silicon Substrate. Currently, This Is The Most Commonly Used Integrated Circuit Fabrication Process Technology And Is One Of The Latest Fabrication Techniques To Use Metal Oxide Semiconductor Transistors.



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